Foreign High-Tech R&D in China: Risks, Rewards, and Implications for U.S.-China Relations

Research-Technology Management, November-December 2003 | Go to article overview

Foreign High-Tech R&D in China: Risks, Rewards, and Implications for U.S.-China Relations


Kathleen Walsh; The Henry L. Stimson Center, 11 Dupont Circle, NW, Washington, DC 20036: 142 pp. (softcover) PDF available at www.stimson.org

This report examines the emergence and evolution of foreign-invested R&D centers in China, with a focus on the computer and telecommunications industries. Based on over 35 interviews conducted in the PRC and Hong Kong in 2002, and supplemented with interviews with experts in the United States, the report finds that over 200 foreign high-tech and R&D centers, programs or labs have been established on the Mainland in the computer and telecommunications sector between 1990 and 2002.

After describing the type of R&D undertaken at these centers and how the nature of this work has changed over time, the report examines the risks and rewards that both sides must consider. It concludes that, although foreign R&D centers are contributing to China's impressive high-tech growth and increasing technological advances, they are contributing as much or more--under newly consolidated WFOEs (wholly foreign-owned enterprises)--to foreign companies' high-tech development and production capabilities and, thus, to the U.S. economy. However, it cautions that while "the rewards from high-tech R&D investments in China appear at present to outweigh the potential risks to U.S. interests, how risky these activities ultimately are depends largely on decisions made by individual corporate executives and R&D enterprise managers.... it is imperative that both U.S. industry executives and policymakers have the data they need to make well-informed decisions on high-tech R&D investments in China.

"At present, this data is sorely lacking (according to one estimate, existing data captures no more than 5-10 percent of all global R&D alliances); even less data is available on R&D activities in developing countries such as China. As long as this situation persists, U. …

The rest of this article is only available to active members of Questia

Already a member? Log in now.

Notes for this article

Add a new note
If you are trying to select text to create highlights or citations, remember that you must now click or tap on the first word, and then click or tap on the last word.
One moment ...
Default project is now your active project.
Project items

Items saved from this article

This article has been saved
Highlights (0)
Some of your highlights are legacy items.

Highlights saved before July 30, 2012 will not be displayed on their respective source pages.

You can easily re-create the highlights by opening the book page or article, selecting the text, and clicking “Highlight.”

Citations (0)
Some of your citations are legacy items.

Any citation created before July 30, 2012 will labeled as a “Cited page.” New citations will be saved as cited passages, pages or articles.

We also added the ability to view new citations from your projects or the book or article where you created them.

Notes (0)
Bookmarks (0)

You have no saved items from this article

Project items include:
  • Saved book/article
  • Highlights
  • Quotes/citations
  • Notes
  • Bookmarks
Notes
Cite this article

Cited article

Style
Citations are available only to our active members.
Buy instant access to cite pages or passages in MLA, APA and Chicago citation styles.

(Einhorn, 1992, p. 25)

(Einhorn 25)

1. Lois J. Einhorn, Abraham Lincoln, the Orator: Penetrating the Lincoln Legend (Westport, CT: Greenwood Press, 1992), 25, http://www.questia.com/read/27419298.

Cited article

Foreign High-Tech R&D in China: Risks, Rewards, and Implications for U.S.-China Relations
Settings

Settings

Typeface
Text size Smaller Larger Reset View mode
Search within

Search within this article

Look up

Look up a word

  • Dictionary
  • Thesaurus
Please submit a word or phrase above.
Print this page

Print this page

Why can't I print more than one page at a time?

Help
Full screen

matching results for page

    Questia reader help

    How to highlight and cite specific passages

    1. Click or tap the first word you want to select.
    2. Click or tap the last word you want to select, and you’ll see everything in between get selected.
    3. You’ll then get a menu of options like creating a highlight or a citation from that passage of text.

    OK, got it!

    Cited passage

    Style
    Citations are available only to our active members.
    Buy instant access to cite pages or passages in MLA, APA and Chicago citation styles.

    "Portraying himself as an honest, ordinary person helped Lincoln identify with his audiences." (Einhorn, 1992, p. 25).

    "Portraying himself as an honest, ordinary person helped Lincoln identify with his audiences." (Einhorn 25)

    "Portraying himself as an honest, ordinary person helped Lincoln identify with his audiences."1

    1. Lois J. Einhorn, Abraham Lincoln, the Orator: Penetrating the Lincoln Legend (Westport, CT: Greenwood Press, 1992), 25, http://www.questia.com/read/27419298.

    Cited passage

    Thanks for trying Questia!

    Please continue trying out our research tools, but please note, full functionality is available only to our active members.

    Your work will be lost once you leave this Web page.

    Buy instant access to save your work.

    Already a member? Log in now.

    Author Advanced search

    Oops!

    An unknown error has occurred. Please click the button below to reload the page. If the problem persists, please try again in a little while.